同大類(lèi)學(xué)科其它級(jí)別期刊:
中科院 1區(qū) 期刊 JCR Q1 期刊 中科院 2區(qū) 期刊 JCR Q2 期刊 中科院 3區(qū) 期刊 JCR Q3 期刊 中科院 4區(qū) 期刊 JCR Q4 期刊國(guó)際簡(jiǎn)稱(chēng):JPN J APPL PHYS 參考譯名:日本應(yīng)用物理學(xué)雜志
主要研究方向:物理-物理:應(yīng)用 非預(yù)警期刊 審稿周期: 約2.0個(gè)月
《日本應(yīng)用物理學(xué)雜志》(Japanese Journal Of Applied Physics)是一本由Japan Society of Applied Physics出版的以物理-物理:應(yīng)用為研究特色的國(guó)際期刊,發(fā)表該領(lǐng)域相關(guān)的原創(chuàng)研究文章、評(píng)論文章和綜述文章,及時(shí)報(bào)道該領(lǐng)域相關(guān)理論、實(shí)踐和應(yīng)用學(xué)科的最新發(fā)現(xiàn),旨在促進(jìn)該學(xué)科領(lǐng)域科學(xué)信息的快速交流。該期刊是一本未開(kāi)放期刊,近三年沒(méi)有被列入預(yù)警名單。
The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).
JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields:
? Semiconductors, dielectrics, and organic materials
? Photonics, quantum electronics, optics, and spectroscopy
? Spintronics, superconductivity, and strongly correlated materials
? Device physics including quantum information processing
? Physics-based circuits and systems
? Nanoscale science and technology
? Crystal growth, surfaces, interfaces, thin films, and bulk materials
? Plasmas, applied atomic and molecular physics, and applied nuclear physics
? Device processing, fabrication and measurement technologies, and instrumentation
? Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
CiteScore | SJR | SNIP | CiteScore 指數(shù) | ||||||||||||
3 | 0.307 | 0.631 |
|
名詞解釋?zhuān)?/b>CiteScore 是衡量期刊所發(fā)表文獻(xiàn)的平均受引用次數(shù),是在 Scopus 中衡量期刊影響力的另一個(gè)指標(biāo)。當(dāng)年CiteScore 的計(jì)算依據(jù)是期刊最近4年(含計(jì)算年度)的被引次數(shù)除以該期刊近四年發(fā)表的文獻(xiàn)數(shù)。例如,2022年的 CiteScore 計(jì)算方法為:2022年的 CiteScore =2019-2022年收到的對(duì)2019-2022年發(fā)表的文件的引用數(shù)量÷2019-2022年發(fā)布的文獻(xiàn)數(shù)量 注:文獻(xiàn)類(lèi)型包括:文章、評(píng)論、會(huì)議論文、書(shū)籍章節(jié)和數(shù)據(jù)論文。
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理與天體物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理與天體物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理與天體物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理與天體物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
Top期刊 | 綜述期刊 | 大類(lèi)學(xué)科 | 小類(lèi)學(xué)科 | ||
否 | 否 | 物理與天體物理 | 4區(qū) | PHYSICS, APPLIED 物理:應(yīng)用 | 4區(qū) |
按JIF指標(biāo)學(xué)科分區(qū) | 收錄子集 | 分區(qū) | 排名 | 百分位 |
學(xué)科:PHYSICS, APPLIED | SCIE | Q3 | 134 / 179 |
25.4% |
按JCI指標(biāo)學(xué)科分區(qū) | 收錄子集 | 分區(qū) | 排名 | 百分位 |
學(xué)科:PHYSICS, APPLIED | SCIE | Q4 | 140 / 179 |
22.07% |
Author: Zhang, Fawang; Wang, Biyi; Liu, Xinyi; Xu, Man; Liu, Hufeng; Miao, Xinxiang; Lu, Tao; Qiu, Rong; Guo, Decheng; Zhou, Qiang; Jiang, Yong
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca3e4
Author: Zhang, Bin; Wang, Jinyan; Li, Mengjun; Huang, Chengyu; He, Jiayin; Wang, Xin; Wang, Chen; Wang, Hongyue; Mo, Jianghui; Wang, Maojun; Wu, Wengang
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca3e3
Author: Wu, Ting; He, Yi-wen; Wong, Yu-po; Li, Wuping; Bao, Jing-fu; Hashimoto, Ken-ya
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca5d8
Author: Luo, Jie; Gong, Mengtao; Tian, Shouqin; Zhou, Lincan; Zheng, Tao; Zhao, Xiujian; Liu, Baoshun
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acae68
Author: Liang, Bin; Luo, Deng; Sun, Qian; Chen, Yanrong; Zhang, Kangkai; Chen, Wangyong
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca7a6
Author: Jiang, Hao; Wang, Ke; Gong, Chen; Murakami, Hironaru; Tonouchi, Masayoshi
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acae52
Author: Gao, Yuanbin; Chu, Chunshuang; Hang, Sheng; Zhang, Yonghui; Zhou, Jianwei; Zhang, Zi-Hui
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acaba0
Author: Chen, Yang; Wu, Jinbo; Zhao, Xiaomeng; Li, Zhongxu; Ke, Xinjian; Zhang, Shibin; Zhou, Min; Huang, Kai; Ou, Xin
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca5d7
Apl Photonics
中科院 1區(qū) JCR Q1
Infrared Physics & Technology
中科院 3區(qū) JCR Q2
Japanese Journal Of Applied Physics
中科院 4區(qū) JCR Q3
Epl
中科院 4區(qū) JCR Q2
Optics Express
中科院 2區(qū) JCR Q2
Journal Of Nonlinear Mathematical Physics
中科院 4區(qū) JCR Q2
Acta Photonica Sinica
中科院 4區(qū) JCR Q4
Photonics
中科院 4區(qū) JCR Q2
若用戶需要出版服務(wù),請(qǐng)聯(lián)系出版商:JAPAN SOC APPLIED PHYSICS, KUDAN-KITA BUILDING 5TH FLOOR, 1-12-3 KUDAN-KITA, CHIYODA-KU, TOKYO, JAPAN, 102-0073。